光學晶體奈米精度加工技術 2023/07/11

簡介 Introductions

精密晶體光學元件可應用於雷射源、曝光機等高端系統，在半導體設備之光學零組件市場中，因硬脆材料透鏡具有明顯的異向性及次表層損傷之特性，導致拋光製程不易掌控、製程成本高及量產性低。本技術建立可在大氣環境下運作之微能量束加工平台，以滿足目前精密零組件加工之需求。

Precision crystal optical elements can be applied to high-end systems such as laser sources and exposure equipment. In the optical component market of semiconductor equipment, due to the obvious anisotropy and subsurface damage of hard and brittle material lenses, the polishing process is difficult to control, it is costly and has poor scalability. This technology establishes a micro-energy beam processing platform that can operate in an atmospheric environment to meet the current needs of precision component processing.

特色與創新 Characters and Innovations

• 以脈衝式 RF 驅動實現低工作溫度及高化學反應基密度 的微型區域精度修整。
• 可在大氣環境下運作，以20 nm/s 移除率進行表面加工，可達到形狀精度 ≦ λ/10。
• 自主建立能量束刀具庫及蝕刻解析函數，可適應性及最佳化調整處理精度達到 PV~0.05 λ (30 nm)。
• Micro-area precision finishing with low operating temperature and high chemical reactive base density with pulsed RF drive.
• Can operate in the atmospheric environment, achieving PV ≦ λ/10 when performing at a surface processing removal rate of 20 nm/s.
• The energy beam tool library and the etching analytical function are established with a processing accuracy which is adapted and optimized to reach PV ~ 0.05 λ (30 nm).

應用與效益 Applications and Benefits

• 光學透鏡、玻璃基板、微區改質加工。
• Optical lenses, glass substrates, micro area modification processing.

聯絡 contact

• 翁志強 Chih-Chiang Weng
• TEL:886-3-5918795
• FAX:886-3-5820043
• E-mail: PeterWeng@itri.org.tw

更多資訊

微能量束輔助拋光系統 Micro Energy Beam Assisted Polishing System

軟體開發/演算法開發 Software Development/Algorithm Development