薄膜製程優化模擬器與設備技術 2023/07/11

簡介 Introductions

目前精密鍍膜國內自主化技術正待建立，亟需解決 ALD 產能慢與 PECVD 薄膜緻密性低之問題，藉由多重物理耦合 結合 AI 技術，以降低設計模型的不確定性和搜尋最佳製程參數，協助工程師加速設定製程參數的時間，提升 Time-To-Market 的能力，優化縮短設備模組開發時程。

The current domestic precision coating technology is yet to be established for the urgent need to solve the problems of slow production of ALD and PECVD film low density. Combining AI technology with multiple physical couplings reduces model uncertainty and searches for the best process parameters, assists engineers in accelerating the time to set process parameters, improves the ability of time-to-market and optimizes equipment module design.

特色與創新 Characters and Innovations

• 整合「多重物理耦合技術」，研發「表面化學反應路 徑決策技術」，精簡化學反應式，縮短分析模擬時間 及提昇模擬分析之準確度。如開發 ALD+PECVD 複合鍍膜製程設備，鍍超薄複合薄膜結構 ( 膜厚<10 nm) 達到晶體複合結構功能或隔絕層需求。其薄膜厚度不均勻性≦ 3% ，奈米堆疊 (nano-laminat) 水氣穿透率(WVTR) ≦ 5x10^-6 g/m² day。
• Integrates “multiple physical coupling technology” and develops “surface chemical reaction path decision technology” to simplify chemical reaction equations, shorten the analysis simulation time and improve simulation analysis accuracy. As an example, development of ALD + PECVD composite coating process equipment to coat ultra-thin composite film structures (film thickness <10nm) that achieve crystalline composite structure function or insulation layer requirements. The film thickness non-uniformity is ≦3%, and nano-laminate vapor transmission rate is ≦5x10^-6g/m²/day.

應用與效益 Applications and Benefits

• 創新 ALD+PECVD 專利鍍膜設備兼顧產能與薄膜緻密 性，符合高規的 3C 鍍膜產品開發。此模擬器技術可應用於光電半導體產業之鍍膜製程上，可提高高亮度 LED、大功率、無線通信等光電元件的品質，亦可 用於其他半導體、太陽能產業等薄膜製程和設備（如 PECVD，PVD）上。
• Innovative ALD+PECVD patented coating equipment achieves production capacity and film densification, meeting the high standards for developing 3C coating product. This simulator technology can be applied to coating processes in the optoelectronic semiconductor industry to control the quality of optoelectronic components, such as high-brightness LEDs, high-power devices, and wireless communications. It can also be used in semiconductor and solar energy industries and other thin-film processes and equipment (such as PECVD, PVD).

聯絡 contact

• 梁沐旺 Muh-Wang Liang
• TEL:886-3-5916567
• FAX:886-3-5820043
• E-mail:MWLiang@itri.org.tw

更多資訊

ALD+PECVD 雙模態鍍膜設備 ALD + PECVD Dual Mode Coating Equipment

多重物理耦合 Multiple Physical Coupling